Name: 8/6/4/2インチ LPCVD酸化炉 完全自動化 低酸素制御 薄膜堆積
Uploaded: 2026-03-10CDT00:13:12-05:00
Duration: 46 s
Description: Discover the 8/6/4/2Inch LPCVD Oxidation Furnace, a fully automated system for thin film deposition with low oxygen control. Ideal for semiconductor manufacturing, it ensures excellent film uniformity and repeatability, supporting various oxidation, annealing, and LPCVD processes. Perfect for high-volume production with seamless MES integration.

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8/6/4/2インチ LPCVD酸化炉完全自動化低酸素制御薄膜堆積

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April 27, 2025

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Discover the 8/6/4/2Inch LPCVD Oxidation Furnace, a fully automated system for thin film deposition with low oxygen control. Ideal for semiconductor manufacturing, it ensures excellent film uniformity and repeatability, supporting various oxidation, annealing, and LPCVD processes. Perfect for high-volume production with seamless MES integration.

8/6/4/2インチ LPCVD酸化炉 完全自動化 低酸素制御 薄膜堆積

8/6/4/2インチ LPCVD酸化炉完全自動化低酸素制御薄膜堆積